High Heat Flux Removal Using Optimized Microchannel Heat Sink

2018 24rd International Workshop on Thermal Investigations of ICs and Systems (THERMINIC)(2018)

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摘要
In this paper, we report on a silicon-based compact micro channel heat sink that enables high heat flux dissipation. Using advanced CMOS compatible silicon fabrication, high aspect ratio micro channels, 32 μm wide and 160 μm deep were realized. The heat sink was interfaced to a small 5.0 mm × 5.0 mm silicon-based thermal test chip. A very low thermal contact resistance between the heat sink and the heater die was achieved using an optimized Cu/Sn-Au interface. As a result, a low total thermal resistance of 0.36 K/W (9mm 2 K/W) at the pump power of about 2 W was achieved on the assembled device. The design, fabrication, measurements on cooling performance and 3D modelling of the device are included in this paper.
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关键词
advanced CMOS compatible silicon fabrication,high aspect ratio microchannels,thermal test chip,low thermal contact resistance,low total thermal resistance,high heat flux removal,optimized microchannel heat sink,silicon-based compact microchannel heat sink,high heat flux dissipation,silicon-based thermal test chip,heater die,pump power,cooling performance,3D modelling,size 160.0 mum,size 32.0 mum,wavelength 5.0 mm,wavelength 9.0 mm,size 5.0 mm,Cu-SnAu
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