Extending Copper Interconnects and Epoxy Dielectrics to Multi-GHz Frequencies

Junghyun Park, Jiayou Xu, Anthony Engler,Jaimal Williamson,Varughese Mathew,Sunggook Park,John Flake

IEEE Transactions on Components, Packaging and Manufacturing Technology(2024)

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摘要
Future multichip packages require Die-to-Die (D2D) interconnects operating at frequencies above 10 GHz; however, the extension of copper interconnects and epoxy dielectrics presents a trade-off between performance and reliability. This paper explores insertion losses and adhesion as a function of interface roughness at frequencies up to 18 GHz. We probe epoxy surface chemistry as a function of curing time and use wet etching to modulate surface roughness. The morphology is quantified by atomic force microscopy (AFM) and two-dimensional fast Fourier transform (2D FFT). Peel test and vector network analysis are used to examine the impacts of both type and level of roughness. The trade-offs between power efficiency and reliability are presented and discussed.
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关键词
Die-to-Die (D2D) interconnects,root mean square (RMS) roughness,spatial frequency,insertion loss,adhesion strength,atomic force microscopy (AFM),two-dimensional fast Fourier transform (2D FFT),x-ray photoelectron spectroscopy (XPS),vector network analysis (VNA),90°-peel test
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