Nonconducting RF and DC Hot Carrier Stresses in 14/16-nm FinFETs for RF Power Amplifiers

IEEE TRANSACTIONS ON ELECTRON DEVICES(2023)

引用 0|浏览2
暂无评分
摘要
Hot carrier reliability under nonconducting (NC) RF and dc stresses is measured and modeled on 14/16-nm FinFETs used for RF PAs. The impact of stress on I - V and RF parameters is examined. RF parameter stress response suggests that degradations are located near the drain end of the channel within the pinch-off region. For classic V-gs = 0 V OFF-state RF stress, quasi static-approximation (QSA) significantly underestimates degradation, necessitating measurement-based lifetime modeling. At near-threshold V-gs, a condition of interest for our PAs, the degradation shows significant die-to-die variations dominated by variations of the subthreshold channel current that initiates the hot carriers. Modeling accounting for the subthreshold channel current variations shows that the near-threshold RF stress is approximately quasi-static. The results show that these FinFETs provide enough margins against NC RF stress for the intended PA applications.
更多
查看译文
关键词
Stress,Radio frequency,Degradation,Stress measurement,Semiconductor device measurement,Scattering parameters,Hot carriers,Hot carrier stress,nonconducting (NC) stress,power amplifiers (PAs),reliability,RF stress
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要