Self-Oscillated Growth Formation of Standing Ultrathin Nanosheets out of Uniform Ge/Si Superlattice Nanowires

Self-oscillation is an intriguing and omnipresent phenomenon that governs a broad range of growth dynam-ics and formation of nanoscale periodic and delicate heterostructures.A self-oscillating growth phenomenon of catalyst droplets,consuming surface-coating a-Si/a-Ge bilayer,is exploited to accomplish a high-frequency alter-nating growth of ultrathin crystalline Si and Ge(c-Si/c-Ge)nano-slates,with Ge-rich layer thickness of 14-19 nm,embedded within a superlattice nanowire structure,with pre-known position and uniform channel diameter.A subsequent selective etching of the Ge-rich segments leaves a chain of ultrafine standing c-Si nanosheets down to～6nm thick,without the use of any expensive high-resolution lithography and growth modulation control.A ternary-phase-competition model has been established to explain the underlying formation mechanism of this nanoscale self-oscillating growth dynamics.It is also suggested that these ultrathin nanosheets could help to produce ultrathin fin-channels for advanced electronics,or provide size-specified trapping sites to capture and position hetero nanoparticle for high-precision labelling or light emission.