$p$ -GaN"/>

Impact of Inadequate Mg Activation on Dynamic Threshold Voltage of Schottky-type $p$-GaN Gate HEMTs

2023 35th International Symposium on Power Semiconductor Devices and ICs (ISPSD)(2023)

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摘要
To further reduce the forward gate current of Schottky-type $p$ -GaN gate HEMTs, inadequate Mg activation in $p$ -GaN is deployed in this work, which tends to convert the conventional $p$ -GaN into insulating GaN with high concentration of Mg passivated by hydrogens. The free hole concentration in $p$ -GaN is reduced, and so is the hole deficiency effect that is the main cause of dynamic threshold voltage ( $V_{\text{TH}}$ ) in commercial Schottky-type $p$ -GaN gate HEMTs. However, plenty of electron traps left in $p$ -GaN lead to more significant dynamic $V_{\text{TH}}$ shift (up to 6 V) under reverse gate bias ( $V_{\text{GSQ}}$ , up to -13 V), as revealed by the $V_{\text{TH}}$ recovery processes under different conditions of light illumination and forward gate bias. Fortunately, under forward $V_{\text{GSQ}}$ , the fully depleted $p$ -GaN layer facilitates electron acceleration by the electric field, suppressing the electron trapping and consequent dynamic $V_{\text{TH}}$ shift. Besides, deeper-level electron trapping in AlGaN may account for the slight dynamic $V_{\text{TH}}$ shift under $V_{\text{GSQ}}\geq 7\mathrm{V}$ .
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关键词
Electron trapping,Mg activation,$p$-GaN gate HEMT,threshold voltage
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