Cryogenic Storage Memory with High-Speed, Low-Power, and Long-Retention Performance

Cryogenic-computing draws attention due to its variety of applications such as cloud-computing, aerospace electronics, and quantum computing. Low temperature (e.g., 77 K) enables higher switching speed, improved reliability, and suppressed noise. Although cryogenic dynamic random-access memory is studied, the cryogenic NAND flash is not explored intensively. Herein, a cryogenic storage memory based on the charge-trap mechanism is reported. By removing the tunneling oxide from the conventional silicon/oxide/nitride/oxide/silicon (SONOS)-type flash memory (therefore becoming silicon/oxide/nitride/silicon (SONS)), high-speed and low-power operation is aimed to be achieved while relieved from poor retention issue thanks to the cryogenic environment. The FinFET-structured SONS memory device is demonstrated experimentally with gate length of 20-30 nm, which can achieve the retention issue (>10 years) with low voltage (approximate to 6.5 V) and high speed (approximate to 5 mu s) operation at 77 K. To have a holistic system-level evaluation, benchmark simulation of an interface between a host microprocessor and solid-state-drive is conducted, considering the refrigerator cooling cost and the heat loss via cables across two temperatures (300 and 77 K). The results show that the SONS-type cryogenic storage system shows over 81% improvement in both latency and power, compared to the SONOS counterpart located at cryogenics.