Improving Masked Autoencoders by Learning Where to Mask

PATTERN RECOGNITION AND COMPUTER VISION, PRCV 2023, PT VIII(2024)

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摘要
Masked image modeling is a promising self-supervised learning method for visual data. It is typically built upon image patches with random masks, which largely ignores the variation of information density between them. The question is: Is there a better masking strategy than random sampling and how can we learn it? We empirically study this problem and initially find that introducing object-centric priors in mask sampling can significantly improve the learned representations. Inspired by this observation, we present AutoMAE, a fully differentiable framework that uses Gumbel-Softmax to interlink an adversarially trained mask generator and a mask-guided image modeling process. In this way, our approach can adaptively find patches with higher information density for different images, and further strike a balance between the information gain obtained from image reconstruction and its practical training difficulty. In our experiments, AutoMAE is shown to provide effective pretraining models on standard self-supervised benchmarks and downstream tasks.
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关键词
Self-Supervised Learning,Masked Image Modeling
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