Controlled Orientation of Silicon-Containing Diblock Copolymer Thin Films by Substrate Functionalization Under Vacuum

This work demonstrates a simple approach to control the orientation of the self-assembled nanostructured block copolymer thin films of polystyrene-block-polydimethylsilox-ane (PS-b-PDMS) by functionalization of the oxide layer (SiO2) on the Si substrate followed by thermal annealing under low-pressure environmental conditions. The substrate can be functionalized through two-step grafting of hydroxy-terminated polystyrene brush (PS-OH brush) followed by hydroxy-terminated polydimethylsi-loxane brush (PDMS-OH brush) onto the wafer substrate. By controlling the grafting ratio of PS-OH and PDMS-OH brushes, the affinities of the PS and PDMS blocks with the substrates can be fine-tuned to provide a neutral substrate in order to form perpendicular cylinders from the bottom after thermal annealing. Owing to the vacuum-driven orientation [i.e., thermal annealing under low-pressure environment conditions (similar to 10-4 Pa)], the orientation of the cylinders can be controlled at the air/polymer interface. Interestingly, by combining the vacuum-driven approach with substrate functionalization, perpendicular cylinders from the air/polymer interface and substrate/polymer interface can be generated, respectively. Consequently, well-aligned perpendicular cylinders with long-range ordering can be fabricated by the self-alignment process.