Optically Active Chalcogen Vacancies in Monolayer Semiconductors

Defect engineering of atomically thin semiconducting crystals is an attractive route to developing single-photon sources and valleytronic devices. For these applications, defects with well-defined optical characteristics need to be generated in a precisely controlled manner. However, defect-induced optical features are often complicated by the presence of multiple defect species, hindering the identification of their structural origin. Here, we report systematic generation of optically active atomic defects in monolayer MoS2, WS2, MoSe2, and WSe2 via proton-beam irradiation. Defect-induced emissions are found to occur approximate to 100 to 200 meV below the neutral exciton peak, showing typical characteristics of localized excitons such as saturation at high-excitation rates and long lifetime. Using scanning transmission electron microscopy, it is shown that freshly created chalcogen vacancies are responsible for the localized exciton emission. Density functional theory and ab initio GW plus Bethe-Salpeter-equation calculations reveal that the observed emission can be attributed to transitions involving defect levels of chalcogen vacancy and the valence band edge state.