Defect detection and classification on imec iN5 node BEoL test vehicle with MultiSEM

Jens Timo Neumann,Abhilash Srikantha, Philipp Huthwohl,Keumsil Lee, James B. William, Thomas Korb, Eugen Foca,Tomasz Garbowski, Daniel Boecker,Sayantan Das,Sandip Halder

METROLOGY, INSPECTION, AND PROCESS CONTROL XXXVI(2022)

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摘要
We present an automated application for defect detection and classification from ZEISS MultiSEM (R) images, based on Machine Learning ( ML) technology. We acquire MultiSEM images of a semiconductor wafer suited for process window characterization at the imec iN5 logic node and use a dedicated application to train ML models for defect detection and classification. We show the user flow for training and execution, and the resulting capture and nuisance rates. Due to straightforward parallelization, the application is designed for the large amounts of data generated rapidly by the MultiSEM.
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关键词
MultiSEM, inspection, defect detection, defect classification, Machine Learning
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