Numerical and experimental analysis of patterning multi-period and multi-radius metasurfaces

Plasmonic imaging technology can offer a novel way for nanofabrication, with the advantages of low-cost, high yield, and large area, having potentially promising applications in various nanostructures manufacturing. However, the previous studies mainly focus on the simulation and experimental research of fixed period or fixed structure size metasurface fabrication, which limits the range of its applications. In this paper, we proposed and analyzed the imaging characteristics of the reflective plasmonic structures, selected the best structure in the fabrication process by parameter analyses, and concluded that the air gap has the most significant influence on imaging quality of plasmonic imaging technology. Then we experimentally demonstrated its ability in fabricating multi-scale patterns. A 10mm × 16 mm large-scale structural color metasurface with periods from 414.3 to 580 nm has been designed and manufactured. Furthermore, the feasibility of fabricating metasurface whose radius varies from 75 to 150 nm is also verified under the same condition. The proposed method is expected to have widespread applications in multi-functional metasurface devices.