Lithography-free tunable absorber at visible region via one-dimensional photonic crystals consisting of an alpha-MoO3 layer

Flexible control of light absorption within the lithography-free nanostructure is crucial for many polarization-dependent optical devices. Herein, we demonstrated that the lithography-free tunable absorber (LTA) can be realized by using two one-dimensional (1D) photonic crystals (PCs) consisting of an alpha-MoO3 layer at visible region. The two 1D PCs have different bulk band properties, and the topological interface state-induced light absorption enhancement of alpha-MoO3 can be realized as the alpha-MoO(3 )thin film is inserted at the interface between the two 1D PCs. The resonant cavity model is proposed to evaluate the anisotropic absorption performances of the LTA, and the results are in good agreement with those of the transfer matrix method (TMM). The absorption efficiency of the LTA can be tailored by the number of the period of the two PCs, and the larger peak absorption is the direct consequence of the larger field enhancement factor (FEF) within the a-MoO3 layer. In addition, near-perfect absorption can be achieved as the LTA is operated at the over-coupled resonance. By varying the polarization angle, the absorption channels can be selected and the reflection response can be effectively modulated due to the excellent in-plane anisotropy of alpha-MoO3. (C) 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement