Degradation Mechanism And Stability Improvement Of Dopant-Free Zno/Lifx/Al Electron Nanocontacts In Silicon Heterojunction Solar Cells

Dopant-free passivating contacts for photovoltaics have the potential to be deposited at low costs while providing excellent surface passivation and low contact resistance. However, one pressing issue of dopant-free carrier selective contacts is their lower environmental stability compared to conventional silicon-based contacts. In this contribution, we study the degradation in the ZnO/LiFx/Al electron selective nanocontact with experiments and simulations and suggest design modifications for higher performance and stability. Using a thicker metallization and optimal ZnO deposition temperature (130 degrees C), we improved open-circuit voltage and fill factor, together with improved stability with retention of over 93 and 88% of the initial open-circuit voltage and fill factor after storage in air for 380 h. The champion device has reached an efficiency of 21.3% with V-OC of 727 mV, J(SC) of 37.6 mA/cm(2), and FF of 78.0%. Furthermore, the enhanced stability in vacuum, scanning transmission electron microscopy (STEM) images, and the current-exchange simulation suggests that the degradation of the a-Si:H(i)/ZnO/LiFx/Al contact is caused by a drop of the LiFx/Al work function, due to interaction with air. This work has developed a deep understanding of the degradation mechanism and the methodology of stability analysis for dopant-free silicon solar cells.