Maintaining superior crystallinity and conductivity in boron-doped nc-Si ultra-thin films by hydrogen plasma treatment

In view of using doped nanocrystalline Si (nc-Si) as the emitter layer in nc-Si/crystalline-Si heterojunction solar cells, a very thin (≤ 50 nm) emitter layer with high conductivity and superior crystallinity is optimum. In the present work, p-nc-Si:H thin film prepared in inductively coupled plasma chemical vapor deposition, without using additional H2-dilution in [SiH4 + B2H6 (1% in H2)]-plasma, retains conductivity ~10−1 S cm−1 and crystallinity ~68% at a low thickness (t) ~50 nm. The charge carrier transport through the heavily doped nc-Si network demonstrates reverse Meyer–Neldel characteristics for t ≥ 50 nm. However, with reduction to t < 50 nm, the evolution of the ultra-nanocrystalline dominated amorphous network, accompanied by accumulation of Si–H–Si platelet-like components in the grain boundary, leads to a drastic reduction in conductivity to 10−4 S cm−1. In this context, the post-deposition and short-time hydrogen plasma treatment (PSHPT) on the as-deposited ultra-thin (t ~30 nm) film becomes instrumental in substantially enhancing the crystallinity from 40% to 69% and increasing conductivity by two orders of magnitude to 10−2 S cm−1. The network modification by PSHPT proceeds via transformation of the surface and sub-surface weak bonds and is significant for the ultra-thin film compared to the thick film, due to retaining a superior surface-to-bulk ratio.