Ultimate bunch length and emittance performance of an MeV ultrafast electron diffraction apparatus with a dc gun and a multicavity superconducting rf linac

We present the design of a high repetition rate MeV energy ultrafast electron diffraction instrument based on a dc photoelectron gun and an superconducting rf (SRF) linac with multiple independently controlled accelerating and bunching cavities. The design is based on the existing Cornell photoinjector, which can readily be applied to the presented findings. Using particle tracking simulations in conjunction with multiobjective genetic algorithm optimization, we explore the smallest bunch lengths, emittance, and probe spot sizes achievable. We present results for both stroboscopic conditions (with single electrons per pulse) and with 105 electrons/bunch which may be suitable for single-shot diffraction images. In the stroboscopic case, the flexibility provided by the many-cavity bunching and acceleration allows for longitudinal phase space linearization without a higher harmonic field, providing sub-fs bunch lengths at the sample. Given low emittance photoemission conditions, these small bunch lengths can be maintained with probe transverse sizes at the single micron scale and below. In the case of 10(5) electrons per pulse, we simulate state-of-the-art 5D brightness conditions: rms bunch lengths of 10 fs with 3-nm normalized emittances, while now permitting repetition rates as high as 1.3 GHz. Finally, to aid in the design of new SRF-based ultrafast electron diffraction machines, we simulate the trade-off between the number of cavities used and achievable bunch length and emittance.