Composition, Dielectric Breakdown, And Bandgap Of Ultra-Thin Amorphous Boron Oxynitride Produced By Magnetron Sputtering

Ultra-thin amorphous boron oxynitride films were deposited at room temperature on silicon and polymer substrates using radio frequency magnetron sputtering of a hexagonal boron nitride target in varied argon-nitrogen background gas ratios. The effects of nitrogen content in the sputtering gas, changes in target-to-substrate distance, and magnetron power density on the film composition were investigated with X-ray photoelectron spectroscopy and correlated to the dielectric breakdown strength and bandgap obtained from current-voltage measurements and Tauc plots. Films grown in pure Ar atmosphere at a large target-to-substrate distance displayed compositions containing metallic boron, which led to a decrease in the dielectric breakdown strength. The use of Ar:N2 mixtures and pure N2 eliminated metallic boron bonding. Decreasing the target-to-substrate distance and target power density during reactive sputtering resulted in B:N stoichiometry ratio closer to one and about 25?30 at.% oxygen. Smooth surface morphology films grown in pure N2 at a small target-to-substrate distance exhibited dielectric breakdown strength of 2.1?2.4 MV cm? 1at 30 nm film thickness and bandgap of 5.4 eV. The results show the suitability of amorphous boron oxynitride for application as an insulator or gate dielectric in thin-films flexible transistors and other electronics when a low processing temperature is required.