The Formation Of Tio2/Vo2 Multilayer Structure Via Directional Cationic Diffusion

The alternative VO2/TiO2 nanostructure is a potential candidate for application in optical or electrical devices. A promising and straightforward route to form tunable alternative VO2/TiO2 nanostructure is in high demand. Herein, we demonstrate that the VO2/TiO2 nanostructure could be self-assembled from the VO2 film/TiO2 substrate via directional cationic migration, characterizing Ti-rich nano-lamellas with nanoscale spacing along the c-axis. Through aberration-corrected high-resolution transmission electron microscopy, it has been shown that the realization of directional cationic migration is assisted by the interstitial position inside the VO2 lattice. Non-equilibrium cationic diffusion could even retain these interstitial atoms in the form of incoherent strain lines, which affect the local electronic structure as validated by theoretical calculation. Due to Ti-rich nano-lamellas and incoherent strain lines, the phase transition temperature decreased (similar to 10 degrees C). The idea of tailoring the elemental distribution by directional cationic diffusion significantly broadens the functional application of VO2 films.