Efficient Process Control and Monitoring for HIPIMS Applied to Deposition of ITO Films
SOCIETY OF VACUUM COATERS 59TH ANNUAL TECHNICAL CONFERENCE PROCEEDINGS, 2016(2016)
摘要
High power impulse magnetron sputtering (HIPIMS) is ideal for deposition of high-quality films from plasmas with high content of ionized sputtered species. For the fabrication of indium tin oxide (ITO) films, a ceramic target is typically used. However, ceramic targets are expensive, provide low deposition rates, and are a source of energetic negative oxygen ions, which cause damage and degradation of film properties. Since HIPIMS makes use of high voltage pulses, problems due to energetic negative ions is a concern. A reactive process using metallic targets will reduce the amount and energy of negative oxygen ions. For a reactive HIPIMS process on lab scale, numerous advantages like better coverage of complex-shaped surfaces, higher deposition rate compared to non-reactive mode, room temperature deposition, decreased lateral resistivity, and decreased surface roughness are reported. Nevertheless, upscaling the process to industrial scale still needs a reliable control of the oxygen flow over large-area rotatable targets. In this work, a room-temperature reactive HIPIMS process for deposition of ITO from a 0.6-m-long rotatable target was investigated. A suitable optical emission control was developed. A comparison between films deposited from ceramic and metallic targets was performed in terms of deposition rate and electrical properties.
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