A 256 kb 9 T Near-Threshold SRAM with 1 k Cells per Bit-Line and Enhanced

In this paper, we present a new 9T SRAM cell that has good write-ability and improves read stability at the same time. Simulation results show that the proposed design increases Read SNM (RSNM) and Ion/Ioff of read path by 219% and 113%, respectively at supply voltage of 300mV over conventional 6T SRAM cell in a 90nm CMOS technology. Proposed design lets us to reduce minimum operating voltage of SRAM (V DDmin) to 350mV, whereas conventional 6T SRAM cannot operate successfully with acceptable failure rate at supply voltages bellow 725mV. We also compared our design with three other SRAM cells from recent literature. To verify the proposed design, a 256kb SRAM is designed using new 9T and conventional 6T SRAM cells. Operating at their minimum possible VDDs, the proposed design decreases write and read power per operation by 92%, and 93%, respectively over the conventional rival. Area of proposed SRAM cell is increased by 83% over conventional 6T one. However, due to large Ion/Ioff of read path for 9T cell, we are able to put 1k cells in each column of 256kb SRAM block, resulting in the possibility for sharing write and read circuitries of each column between more cells compared to conventional 6T. Thus, area overhead of 256kb SRAM based on new 9T cell is reduced to 37% compared to 6T SRAM.