Influence of N 2 flow rate on structure and properties of TiBCN films prepared by multi-cathodic arc ion plating and studied with ion beam scattering spectroscopy

TiBCN films were deposited on Si(100) and cemented carbide substrates by using multi-cathodic arc ion plating in C 2 H 2 and N 2 atmosphere. Their structure and mechanical properties were studied systematically under different N 2 flow rates. The results showed that the TiBCN films were adhered well to the substrates. Rutherford backscattering spectroscopy was employed to determine the relative concentration of Ti, B, C and N in the films. The chemical bonding states of the films were explored by X-ray photoelectron spectroscopy, revealing the presence of bonds of TiN, Ti(C,N), BN, pure B, sp 2 C–C and sp 3 C–C, which changed with the N 2 flow rate. TiBCN films contain nanocrystals of TiN/TiCN and TiB 2 /Ti(B,C) embedded in an amorphous matrix consisting of amorphous BN and carbon at N 2 flow rate of up to 250 sccm.