Improved Electrical Performance Thanks to Sb and N Doping in Se-Rich GeSe-Based OTS Selector Devices

2017 IEEE International Memory Workshop (IMW)(2017)

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摘要
In this paper, we investigate the impact of Sb and N doping in Se-rich GeSe based Ovonic Threshold Switching (OTS) selector devices, targeting crossbar memory applications. Through physico-chemical analysis and electrical characterization we demonstrate that Sb doping allows low threshold voltage switching operations, while N doping improves the OFF state resistance stability of Se-rich GeSe based selector devices. Thus, we are able to demonstrate an endurance up to 10 6 cycles, an ON/OFF current ratio of ~ 10 8 and reading selectivity of 10 4 . These values are among the best reported in the literature for an OTS selector. The described material engineering makes Se-rich GeSe based materials suitable for Back-End of Line (BEOL) selector integrations, such as resistive memory crossbar arrays up to 1Mb.
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关键词
improved electrical performance,OTS selector devices,ovonic threshold switching selector devices,physico-chemical analysis,electrical characterization,low threshold voltage switching operations,OFF state resistance stability,back-end of line selector integrations,BEOL,resistive memory crossbar,GeSe:Sb,GeSe:N
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