Radio-Frequency Characteristics of Partial Dielectric Removal HR-SOI and TR-SOI Substrates

High-resistivity silicon-on-insulator (HR-SOI) and trap-rich high-resistivity silicon-on-insulator (TR-SOI) substrates have been widely adopted for high-performance rf integrated circuits. Radio-frequency loss and non-linearity characteristics are measured from coplanar waveguide (CPW) transmission lines fabricated on HR-SOI and TR-SOI substrates. The patterned insulator structure is introduced to reduce loss and non-linearity characteristics. A metal-oxide-semiconductor (MOS) CPW circuit model is established to expound the mechanism of reducing the parasitic surface conductance (PSC) effect by combining the semiconductor characteristic analysis (pseudo-MOS and C-V test). The rf performance of the CPW transmission lines under dc bias supply is also compared. The TR-SOI substrate with the patterned oxide structure sample has the minimum rf loss (<0.2 dB/mm up to 10 GHz), the best non-linearity performance, and reductions of 4 dB and 10 dB are compared with the state-of-the-art TR-SOI sample's, HD2 and HD3, respectively. It shows the potential application for integrating the two schemes to further suppress the PSC effect.