Field-Enhanced Emission Rate And Electronic Properties Of A Defect Introduced In N-Gan By 5.4 Mev He-Ion Irradiation

APPLIED PHYSICS LETTERS(1999)

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摘要
A deep level defect ER3, introduced in n-GaN by high energy (5.4 MeV) He ions, was characterized by deep level transient spectroscopy (DLTS). This defect, 0.196+/-0.004 eV below the conduction band, with an apparent capture cross-section of 3.5+/-1 X 10(-15) cm(2), is introduced uniformly in the region profiled by DLTS at a rate of 3270+/-200 cm(-1). The emission rate of this defect depends on the electric field strength in the space-charge region. This emission rate is modeled according to the Poole-Frenkel distortion of a square well with a radius of 20+/-2 Angstrom or alternatively, a Gaussian well with a characteristic width of 6.0+/-1 Angstrom. Hence, we conclude that ER3 is a point defect which has a field dependence not explained by the classical Poole-Frenkel enhancement. (C) 1999 American Institute of Physics. [S0003-6951(99)02906-X].
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关键词
band gap,field emission,space charge region,cross section,space charge,ion beam,electric field
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