Modeling reliability of GaN/AlGaN/AlN/GaN HEMT

Semiconductor Device Research Symposium(2011)

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摘要
III-V nitrides have attracted intense interest recently for applications in high-temperature, high-power electronic devices operating at microwave frequencies. Gallium Nitride (GaN), with a much larger band gap than Gallium Arsenide, has drawn recent interest in industry for use in blue laser diodes and microwave power field-effect transistors. Even though GaN has three times higher effective electron mass than GaAs, which results in a low-field mobility less than that of GaAs, GaN has some distinct advantages in various applications. Some of these are larger band gap, larger peak electron velocity, higher thermal stability; all of which enables it to be a very promising material for high power, high temperature and high frequency applications.
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III-V semiconductors,aluminium compounds,energy gap,gallium compounds,high electron mobility transistors,high-temperature electronics,semiconductor device models,semiconductor device reliability,wide band gap semiconductors,GaN-AlGaN-AlN-GaN,HEMT reliability modelling,III-V nitrides,band gap,blue laser diodes,effective electron mass,high-temperature high-power electronic devices,low-field mobility,microwave frequency,microwave power field-effect transistors,thermal stability,
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