Growth of ZrW2O8 thin films by pulsed laser deposition

ZrW2O8 thin films were deposited on quartz substrates by pulsed laser deposition using a ZrW2O8 ceramic target and with subsequent annealing. The microstructure, chemical composition and morphology of the ZrW2O8 thin films were observed and determined by X-ray diffraction, X-ray photoelectron spectroscopy and scanning electron microscopy, and the thickness and cohesion of the films were measured by a surface profilometer and a scratching adhesion tester respectively. The results indicate that the as-deposited ZrW2O8 thin film is an amorphous phase, and the stoichiometry of the film is close to that of the ceramic target. The thin film deposited on the unheated substrate has a large surface roughness; however, the film deposited on the substrate heated at 650°C is smooth and compact. Cubic ZrW2O8 thin film can be obtained after annealing heat treatment at 1200°C for 3 min and then quenching in water, and the film has a large grain size, with some cracks along the grain boundaries and some in the grains. The cohesion of the thin film with substrate decreases with the increase of the heat treatment temperature.