Study on the crystallization process of GaSb-Sb2Te3 pseudobinary films for phase-change random access memory.

Non-isothermal change in electrical resistance was used to investigate the crystallization process of GaSb-Sb2Te3 pseudobinary films prepared by co-sputtering using GaSb and Sb2Te3 targets. The crystallization parameters were determined directly by in-situ electrical resistance-temperature measurements. The activation energy of crystallization and rate factor were deduced from the Kissinger's plot. The kinetics exponent was calculated using the Ozawa's method. The crystallization temperature (185 similar to 228 degrees C) and activation energy (2.01 similar to 5.65 eV) increased monotonically with increasing Ga concentration from 5 to 34 mol%, while the average kinetics exponent decreased from 1.63 to 1.02. The crystallization mechanism of the compositions with Ga concentration more than 10 mol% was one-dimensional growth from the nuclei due to the average kinetics exponent smaller than 1.5. Crystallization time of the studied compositions was estimated theoretically by the Johnson-Mehl-Avrami equation and measured experimentally by the reflectivity change induced by the laser pulse. It is shown that Ga27Sb47Te26 film exhibited the shortest crystallization time, suggesting a potential candidate for phase-change random access memory application.