Modeling Magnetron Sputter Deposition

A comprehensive model of the cylindrical magnetron sputtering system is described. Microstructural features that affect the performance of the coating are modeled and compared to experimental data obtained from atomic force microscopy. Dynamic scaling parameters are used to characterize the evolution of grain structure in physical vapor deposition models and in experimental data obtained from atomic force microscopy. Surfaces are described in terms of a roughness exponent alpha, growth exponent beta, and dynamic exponent z . The scaling exponents provide a valuable metric for comparative analysis and as a means of optimizing parameters used in the simulation.