Numerical characterization of dual-frequency capacitively coupled plasmas modulated by electron beam injection

The modulated approach of electron beam (EB) injection can achieve favorable parameters for capacitive coupled plasmas (CCP). In this work, a one-dimensional particle-in-cell/Monte Carlo collision (PIC/MCC) model is used to simulate the stable dual-frequency CCP with EB injection. First, when the parameters of EB are kept constant at 0.01 A and 30 eV, the results demonstrate significant enhancements in electron density, self-bias voltage, and ion flux. Furthermore, the electron energy probability function (EEPF) appears to have a transition from a typical bi-Maxwellian distribution to a Maxwellian distribution, and the dominant heating mode shifts from the alpha-mode to the alpha-gamma-mode. Secondly, when the EB current and energy are all changed, the basic parameters of DF-CCP can be achieved by different modulations. Furthermore, we also discuss the transition of the electron heating mode as the current increases from 0.001 A to 1 A and the energy increases from 10 eV to 490 eV. In particular, we conduct a comparative study among different cases of EB injection. According to these results, the modulation capability of EB injection in DF-CCP is thoroughly investigated, which can greatly benefit atom-scale etching in practical applications.