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Effective Optimization Strategy for Electron Beam Lithography of Molecular Glass Negative Photoresist

Jiaxing Gao,Siliang Zhang,Xuewen Cui,Xue Cong,Xudong Guo,Rui Hu,Shuangqing Wang,Jinping Chen,Yi Li,Guoqiang Yang

ADVANCED MATERIALS INTERFACES（2023）

Cited 9|Views47
Key words
electron beam lithography,molecular glass negative photoresists,photoacid generators,photodegradable nucleophiles
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