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A Review of Performance Variability in MOSFETs Within VLSI Technology: Sources, Mechanisms, and Mitigation Strategies

Yaoting Wang, Dawei Gao,Kai Xu

IEEE Electron Devices Reviews(2025)

Cited 0|Views1
Key words
Line width roughness,metal oxide semiconductor field effect transistor,performance variability,random dopant fluctuation,work function variation
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