Balancing Charge Loss and Carrier Mobility: A Multiscale Modeling Approach for Device Geometry Optimization of VS-DRAM Dual-Gate Access Transistors
IEEE TRANSACTIONS ON ELECTRON DEVICES(2025)
关键词
Transistors,Random access memory,Scattering,Computer architecture,Geometry,Electrons,Semiconductor process modeling,Potential well,Logic gates,Silicon,Carrier mobility,channel thickness optimization,charge loss,multiscale modeling,vertically stacked dynamic random-access memory (VS-DRAM)
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