Atomic-scale Insights into the Material Removal Mechanism of Cerium Oxide Polished Fused Silica Based on ReaxFF-MD
JOURNAL OF MANUFACTURING PROCESSES（2024）
关键词
Fused silica,ReaxFF molecular dynamics,Ultra-smooth surface,CCOS,Polishing mechanism
AI 理解论文
溯源树
样例
生成溯源树，研究论文发展脉络
Chat Paper
正在生成论文摘要