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Engineering Carrier Density and Effective Mass of Plasmonic TiN Films by Tailoring Nitrogen Vacancies.

Shunda Zhang,Tian-Yu Sun,Zhen Wang,Ruyi Zhang,Yu Lin,Shaozhu Xiao,Guanhua Su,Jiachang Bi,Peiyi Li,Hongliang Zhang,Lingyan Liang,Fang Yang,Qinghua Zhang,Liang-Feng Huang,Yanwei Cao

NANO LETTERS（2024）

引用 0|浏览6
关键词
titanium nitride,magnetron sputtering epitaxy,plasmonic properties,nitrogen vacancies,effectivemass
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