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Improving Bias Stability of IGZO Field-Effect Transistors Through CF4 Plasma Treatment of Al2O3 Dielectrics

Seyoung Oh,Ojun Kwon,Min Jeong Kim,Wondeok Seo, Eunjeong Cho,Hyeon Ki Park,Woojin Park,Byungjin Cho

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING（2025）

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Key words
Indium gallium zinc oxide,Aluminum oxyfluoride,Field-effect transistor,Bias stability enhancement,CF4 plasma treatment
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