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Atomistic Simulation of HF Etching Process of Amorphous Si3N4 Using Machine Learning Potential

Changho Hong, Sangmin Oh,Hyungmin An, Purun-hanul Kim, Yaeji Kim,Jae-hyeon Ko, Jiwoong Sue,Dongyean Oh,Sungkye Park,Seungwu Han

ACS Applied Materials & Interfaces(2024)

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关键词
machine learning potential,plasma etching,molecular dynamics,density functional theory,multiscale simulation,silicon nitride
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