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Nonchemically Amplified Molecular Resist Based on Multi-Sulfonium Modified Triptycene for Electron Beam and Extreme Ultraviolet Lithography

Xiaodong Yuan,Jinping Chen,Tianjun Yu,Yi Zeng,Xudong Guo,Shuangqing Wang,Rui Hu, Peng Tian,Michaela Vockenhuber,Dimitrios Kazazis,Yasin Ekinci,Jun Zhao,Yanqing Wu,Guoqiang Yang,Yi Li

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3（2024）

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Key words
nonchemically amplified resist,triptycene,sulfonium,extreme ultraviolet lithography,electron beam lithography
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