Investigation of Silicon Nitride for Spacer Via Plasma-Enhanced Atomic Layer Deposition Using a (Tert-Butylamino)dimethylsilane Precursor
Applied Surface Science（2024）
关键词
Silicon nitride,Gate spacer,Plasma -enhanced atomic layer deposition,(PEALD),(Tert-butylamino)dimethylsilane (TBADMS),Substrate temperature
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