Enhanced Deposition Selectivity of High-k Dielectrics by Vapor Dosing and Selective Removal of Phosphonic Acid Inhibitors
ACS Applied Materials & Interfaces（2024）
Key words
area-selective atomic layer deposition,high-kdielectrics,phosphonic acid,selective removal,vapor-phaseinhibitor
AI Read Science
Must-Reading Tree
Example
Generate MRT to find the research sequence of this paper
Chat Paper
Summary is being generated by the instructions you defined