Device Engineering and Benefit Maximization for Advanced Cryo-CMOS

Hung-Li Chiang,Jui-Jen Wu,Pei-Jun Liao,Tzu-Chiang Chen,Chih-Sheng Chang,Xinyu Bao,Jin Cai, Marvin F. Chang,Harry Chuang,Carlos H. Diaz,H. -S. Philip Wong,Matthias Passlack,Iuliana Radu

2024 INTERNATIONAL VLSI SYMPOSIUM ON TECHNOLOGY, SYSTEMS AND APPLICATIONS, VLSI TSA（2024）

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Key words

Technological Devices,Temperature Reduction,Reliable Way,Gate Dielectric,Tunnel Junction,Voltage Scaling,Subthreshold Slope,CMOS Technology,Planar Devices

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