Efficient Patterning Approaches for Non-Manhattan Layouts by Using Variable Shaped Beam Systems
Photomask Technology 2023（2023）
Abstract
Photonics applications generate more and more interest and they are on the way from research to commercially available products. However, due to versatility and the currently related manufacturing volume of the potential applications, efficient patterning techniques are required. Vistec’s electron-beam lithography systems with Variable Shaped Beam (VSB) and Cell Projection (CP) provide a flexible solution to generate these kind of photonics structures even on large areas. In case of arbitrary curved structures intelligent data preparation software solutions as JES-approximation and target contour calculation can be applied. An example is given to demonstrate the feasibility of these approaches specifically on cell projection.
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Key words
Imaging Systems,Optical Design,Optical Gratings,Illumination Optics,Image Processing
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