Epitaxial RuO_2 and IrO_2 films by pulsed laser deposition on TiO_2(110)
arxiv(2024)
摘要
We present a systematic growth study of epitaxial RuO_2(110) and
IrO_2(110) on TiO_2(110) substrates by pulsed laser deposition. We describe
the main challenges encountered in the growth process, such as a deteriorating
material flux due to laser induced target metallization or the delicate balance
of under- vs over-oxidation of the 'stubborn' Ru and Ir metals. We identify
growth temperatures and oxygen partial pressures of 700 K, 1× 10^-3
mbar for RuO_2 and 770 K, 5× 10^-4 mbar for IrO_2 to optimally
balance between metal oxidation and particle mobility during nucleation. In
contrast to IrO_2, RuO_2 exhibits layer-by-layer growth up to 5 unit cells
if grown at high deposition rates. At low deposition rates, the large lattice
mismatch between film and substrate fosters initial 3D island growth and
cluster formation. In analogy to reports for RuO_2 based on physical vapor
deposition, we find these islands to eventually merge and growth to continue in
a step flow mode, resulting in highly crystalline, flat, stoichiometric films
of RuO_2(110) (up to 30 nm thickness) and IrO_2(110) (up to 13 nm
thickness) with well defined line defects.
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