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A Novel Method for the Determination of Electromigration-Induced Void Nucleation Stresses

J. Shuster-Passage, S. Abdel Razek, M. Mattoo,M. Hauschildt,S. Choi,M. Gall,A. Kteyan,J. -H. Choy,V. Sukharev,M. Kraatz, J. R. Lloyd

2024 IEEE INTERNATIONAL RELIABILITY PHYSICS SYMPOSIUM, IRPS 2024(2024)

引用 0|浏览9
关键词
electromigration,Cu interconnect,nucleation,void growth,critical stress,Wheatstone Bridge,early failure,statistics
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