Metrology-class EUV light source based on broadband emission from copper-target laser produced plasma

Seth L. Cousin, Feng Dong, Matt Hettermann, Dave Houser,Patrick Naulleau

High-Brightness Sources and Light-Driven Interactions Congress（2024）

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摘要

The performance and characteristics of our broadband EUV source derived from copper-based laser produced plasma, currently in use in our EUV reflectometer and EUV Scatterometry tools are presented for the first time in this submission

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