Atomic layer etching of SiO_2 using sequential exposures of Al(CH_3)_3 and H_2/SF_6 plasma

On-chip photonic devices based on SiO_2 are of interest for applications such as microresonator gyroscopes and microwave sources. Although SiO_2 microdisk resonators have achieved quality factors exceeding one billion, this value remains an order of magnitude less than the intrinsic limit due to surface roughness scattering. Atomic layer etching (ALE) has potential to mitigate this scattering because of its ability to smooth surfaces to sub-nanometer length scales. While isotropic ALE processes for SiO_2 have been reported, they are not generally compatible with commercial reactors, and the effect on surface roughness has not been studied. Here, we report an ALE process for SiO_2 using sequential exposures of Al(CH_3)_3 (trimethylaluminum, TMA) and Ar/H_2/SF_6 plasma. We find that each process step is self-limiting, and that the overall process exhibits a synergy of 100 We observe etch rates up to 0.58 Å per cycle for thermally-grown SiO_2 and higher rates for ALD, PECVD, and sputtered SiO_2 up to 2.38 Å per cycle. Furthermore, we observe a decrease in surface roughness by 62 roughened film. The residual concentration of Al and F is around 1-2 can be further decreased by O_2 plasma treatment. This process could find applications in smoothing of SiO_2 optical devices and thereby enabling device quality factors to approach limits set by intrinsic dissipation.