New insights into antifouling property and interfacial mechanism in Photo-Fenton membrane distillation

Membrane distillation (MD), boasting high interception efficiency and low operational pressures, emerges as an innovative membrane technology. However, the occurrence of membrane fouling due to interaction between natural organic matter (NOM) and inorganic ions during the MD process curtails water purification efficiency, thereby constraining its potential applications. To address this quandary, this study integrates sulfate radical-based advanced oxidation processes (SR-AOPs) into MD technology to bolster membrane fouling control. A straightforward hydrothermal method coupled with vacuum filtration was employed to synthesize a Co3O4/Nitrogen-modified carbon quantum dots (NCDs)/PVDF (CN-PVDF) membrane for the first time, which was utilized in the MD treatment of simulated humic acid (HA) wastewater. Under visible light irradiation (1.9 kW/m2), CN-PVDF membrane activation of peroxymonosulfate (PMS) effectively altered the chemical attributes of the MD feed solution and reduced organic matter concentration. Moreover, it dismantled the carboxyl sites on HA that interact with Ca2+, consequently attenuating the formation of organic–inorganic complex pollutants. The XDLVO analysis showcased that photo-Fenton oxidation led to a diminishment in pollutant hydrophobicity, correlating with a 17.59 kT reduction in pollutant-membrane adsorption and a 7.47 kT amplification in adhesion barriers. This strategy transformed the initial two-stage fouling mode into a singular one, which significantly decreased the flux decline and the fouling layer thickness. Furthermore, the CN-PVDF membrane demonstrated self-cleaning capabilities via photo-Fenton. This study advances an innovative approach to bolster the fouling resistance of MD membranes and provides substantial theoretical support for the integration of SR-AOPs and MD technologies.