UV-Assisted Nanoimprint Lithography: The Impact of Loading Effect in Silicon on Nanoscale Pattern of Metalens

Zahrah Alankhli,Zhiyuan Liu,Feras AlQatari,Haicheng Cao,Xiaohang Li

Nanoscale Advances（2024）

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摘要

This work studies the impact of the Silicon (Si) loading effect induced by Deep Reactive Ion Etching (DRIE) of silicon master molds on the UV-nanoimprint lithography (NIL) patterning of nanofeatures....

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