Advanced EUV CAR small molecule compounds design and its impact to etch performance Yinjie Cen,Jong Keun Park, Suzanne M. Coley, Benjamin D. Naab, Li Cui,Emad Aqad, Stefan Alexandrescu, Rochelle Rena, Sylvie Eckert, Jason Behnke,ChoongBong Lee, Karen E. PetrilloAdvances in Patterning Materials and Processes XLI(2024)引用 0|浏览0暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要