Study of selective dry etching Si0.7Ge0.3 with different plasma source in process of gate-all-around FET
Advanced Etch Technology and Process Integration for Nanopatterning XIII(2024)
AI 理解论文
溯源树
样例
生成溯源树,研究论文发展脉络
Chat Paper
正在生成论文摘要
Advanced Etch Technology and Process Integration for Nanopatterning XIII(2024)