Single mask solution to pattern DRAM LILP layer at 42nm pitch using EUV car photoresist Arijit Das, Kiho Yang, Toto Chen, Pierce Chang, Sheng-Tse Chen, Shu-De Gong,Hyo Seon Suh, Jeonghoon Lee, Jan-Frederik Finoulst, Chris Wilson,Paulina A. Rincon-Delgadillo,Murat PakOptical and EUV Nanolithography XXXVII（2024）引用 0|浏览0暂无评分AI 理解论文溯源树样例生成溯源树，研究论文发展脉络Chat Paper正在生成论文摘要
