Directed self-assembly enhanced EUV multi-patterning for low variability metal pitch scalingGurpreet Singh, Nityan Nair, Florian Gstrein, Richard SchenkerOptical and EUV Nanolithography XXXVII(2024)引用 0|浏览0暂无评分AI 理解论文溯源树样例生成溯源树,研究论文发展脉络Chat Paper正在生成论文摘要